Depth Profile Analysis of Plasma-cured Multi Layer Resist
نویسندگان
چکیده
منابع مشابه
Profile Measurement of Resist Surface Using Multi-Array-Probe System
Semiconductor processing in manufacturing must be fast and highly accurate in the measuring of the surface profile of soft thin films such as photoresist. Since photoresist surface is very smooth and deformable, a device to measure is required that will measure vertical direction with a nanometer resolution in height and not damage the film during the measurement. To do this, we developed an ap...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2006
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.19.379